Chromium nitride coatings grown by unbalanced magnetron (UBM) and combined arc/unbalanced magnetron (ABS™) deposition techniques
| Autor: | Wolf-Dieter Münz, T. Hurkmans, J.S. Brooks, D.B. Lewis |
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| Rok vydání: | 1996 |
| Předmět: |
Materials science
Metallurgy Surfaces and Interfaces General Chemistry Partial pressure Adhesion Condensed Matter Physics Surfaces Coatings and Films chemistry.chemical_compound chemistry Etching (microfabrication) Sputtering Cavity magnetron Materials Chemistry Electroplating Chromium nitride Deposition (law) |
| Zdroj: | Surface and Coatings Technology. :192-199 |
| ISSN: | 0257-8972 |
| Popis: | Increasingly chromium nitride coatings are being used as a replacement for electroplated hard chromium in various applications. This paper reports an investigation of chromium nitride coatings deposited at 250°C on various substrates at different N2 partial pressures using both UBM sputtering and ABS techniques. The effect of process parameters on structure, composition, hardness and adhesion have been investigated by XRD, SNMS, SEM and a range of mechanical testing techniques. The presence of Cr, Cr + N, Cr2N, CrN, and mixtures of the phases have been identified and related to both the film composition and the process parameters. Substoichiometric Cr2N films had the greatest hardness with values up to 2100 HV. However, films of this hardness exhibited poor adhesion with critical loads, Lc, of 30 N (HSS) and HRc-DB of “4”, if deposited with UBM only. X-ray diffraction indicated that the poor adhesion exhibited by these films was associated with high internal stress. The adhesion of substoichiometric films with comparable composition and crystal structure deposited in combination with metal ion etching (ABS) increased the critical load values up to 60 N (HSS) and improved the HRc-DB to “1” (HSS). |
| Databáze: | OpenAIRE |
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