Low-temperature crystallization of thin nickel films under the action of atomic hydrogen

Autor:	E. L. Zhavzharov, G. A. Byalik, V. M. Matyushin
Rok vydání:	2007
Předmět:	Nickel Materials science Physics and Astronomy (miscellaneous) Hydrogen chemistry Chemical engineering law chemistry.chemical_element Thin metal Dielectric Crystallization Thermal deposition law.invention
Zdroj:	Technical Physics Letters. 33:571-574
ISSN:	1090-6533 1063-7850
DOI:	10.1134/s1063785007070097
Popis:	The influence of atomic hydrogen on the electrical properties and structure of thin nickel films obtained by thermal deposition in vacuum on dielectric substrates has been studied. The subsequent treatment of deposited films at 300–310 K in atomic hydrogen at a pressure of ∼20 Pa and a density of ∼1019 m−3 leads to the modification of their structure and electrical properties. A mechanism explaining the observed effect of atomic hydrogen on thin metal films is proposed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8eeb3e2992140f807bd8dc0d80b833a6 https://doi.org/10.1134/s1063785007070097 Zobrazit plný text záznamu Plný text ve formátu PDF