A novel two component positive photoresist for deep UV lithography
| Autor: | Georg Pawlowski, Horst Röschert, H.-J. Merrem, P. Wilharm, Charlet R. Lindley, Ralph R. Dammel |
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| Rok vydání: | 1990 |
| Předmět: |
Materials science
business.industry Nanotechnology Photoresist Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention chemistry.chemical_compound chemistry law Component (UML) Optoelectronics Diazo Electrical and Electronic Engineering Photolithography business Lithography |
| Zdroj: | Microelectronic Engineering. 11:491-495 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/0167-9317(90)90157-o |
| Popis: | Multifunctional a - diazo - β - ketoesters (DKE) 6 provide an attractive source of deep UV sensitive photoactive compounds with a broad potential for modification of their chemical, physical and lithographic properties. In combination with highly transparent resins, they offer insights into the development of a positive working deep UV sensitive two - component photoresist. |
| Databáze: | OpenAIRE |
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