A multi-contact six-terminal cross-bridge Kelvin resistor (CBKR) structure for evaluation of interface uniformity of the Ti-Al alloy/p-type 4H-SiC contact

Autor:	Yen-Ling Chen, Shih-Hao Lai, Jian-Hao Lin, Bing-Yue Tsui
Rok vydání:	2023
Zdroj:	2023 35th International Conference on Microelectronic Test Structure (ICMTS).
DOI:	10.1109/icmts55420.2023.10094097
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8e19ece20b0bf2180ea4672b96549803 https://doi.org/10.1109/icmts55420.2023.10094097 Zobrazit plný text záznamu