| Autor: |
Satyajit Shinde, Lawrence Mbonu, Marcus Minchew, Chee Huei Chan |
| Rok vydání: |
2020 |
| Předmět: |
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| Zdroj: |
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). |
| DOI: |
10.1109/asmc49169.2020.9185301 |
| Popis: |
Nitride film LPCVD (Low Pressure Chemical Vapor Deposition) process is well known in semiconductor industry. The paper covers an innovative approach in touching two aspects of improvement in LPCVD nitride process in diffusion furnace. First is the extension of quartz life use by implementation of unique LTP (Low Temperature Purge) without affecting particle performance. Secondly, the impact of extended quartz life on the wafer uniformity across the different zones and methodology to compensate it. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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