Investigation of the Effect of the Short-Term Exposure of Oxygen and Hydrogen Plasma on the Composition and Structure of Thin Tin Dioxide Films

Autor:	N. M. Tompakova, A. A. Polisan
Rok vydání:	2021
Předmět:	Materials Chemistry Electrical and Electronic Engineering Condensed Matter Physics Electronic Optical and Magnetic Materials
Zdroj:	Russian Microelectronics. 50:679-687
ISSN:	1608-3415 1063-7397
DOI:	10.1134/s1063739721080126
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8da5d8db48f5136f6bffd8afeb5e1ac5 https://doi.org/10.1134/s1063739721080126 Zobrazit plný text záznamu Full text from SpringerLink