Design and fabrication of CMOS optical modulator
Autor: | Ching-Liang Dai, Chun-Hui Lin, Hung-Lin Chen, Pei-Zen Chang, Liang-Bin Yu |
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Rok vydání: | 2001 |
Předmět: |
Engineering
business.industry Metals and Alloys Electro-optic modulator Condensed Matter Physics Optical switch Surfaces Coatings and Films Electronic Optical and Magnetic Materials Surface micromachining Optics Optical modulator CMOS Dry etching Electrical and Electronic Engineering business Instrumentation Low voltage Diffraction grating |
Zdroj: | Sensors and Actuators A: Physical. 95:69-74 |
ISSN: | 0924-4247 |
DOI: | 10.1016/s0924-4247(01)00745-2 |
Popis: | This study describes a micromachined optical modulator with electrostatic actuation, fabricated by the conventional CMOS process. The optical modulator is operated by the interaction of fixed stationary gratings and movable sliding gratings. The period of the gratings is determined by the slide of the movable part, allowing different diffraction patterns of reflected light. In addition, 100% modulation in the first order can act as an optical switch. All procedures following the CMOS process require a simple post-process. Maskless dry etching was the only requirement of the post-process to obtain a high-aspect-ratio microstructure, and only a low voltage of 20 V was necessary to drive the actuator of the optical modulator. The micromachined optical modulator proposed herein is smaller and weighs less than commercially available acoustic optical modulators. |
Databáze: | OpenAIRE |
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