A simple procedure for fabricating molecular-sized gap junctions using conventional photolithography
| Autor: | Yuji Kawanishi, Yasuhisa Naitoh, Takashi Funaki, Hidekazu Abe, Yasuzo Suzuki, Tien-Tzu Liang, Tetsuo Shimizu, Wataru Mizutani, Tetsuo Yatabe, Masayo Horikawa |
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| Rok vydání: | 2006 |
| Předmět: |
Materials science
Fabrication Mechanical Engineering Nanowire Conductance Bioengineering Nanotechnology General Chemistry Thermal conduction Electromigration law.invention Molecular wire Mechanics of Materials law General Materials Science Electrical and Electronic Engineering Photolithography Nanoscopic scale |
| Zdroj: | Nanotechnology. 17:2406-2410 |
| ISSN: | 1361-6528 0957-4484 |
| DOI: | 10.1088/0957-4484/17/9/056 |
| Popis: | We describe a procedure for fabricating sub-5 nm gap junctions with sub-100 nm electrode-width using conventional photolithography. The fabrication procedure involves two photolithographic processes followed by shadow evaporation and electromigration. After lift-off following the second metal shadow evaporation, a nanoscale wire with a diameter less than 100 nm is fabricated along a sidewall of the second patterned photo-resist. The nanowire is cut by a milliamp current flow, then a sub-5 nm gap metal junction with a sub-100 nm electrode-width is fabricated. The temperature dependence of the conductance of the molecular wires that were bridging the junctions over the ultrasmall gap indicated a hopping conduction behaviour. The results demonstrate that these junctions can be used in the study of conductance measurements through molecular wires. |
| Databáze: | OpenAIRE |
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