| Autor: |
Yuval Bloomberg, C. C. Lin, Luke T. H. Hsu, Anja Rosenbusch, Simon Kurin |
| Rok vydání: |
2004 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
The paper presents the results of a study to define a production-worthy inspection technique for subresolution solid and hollow scattering features used in 193-nm lithography. Masks are inspected using conventional high-NA and aerial-imaging-based mask inspection tools. Inspection results are compared regarding capture rate and nuisance defect rate. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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