Influence of Crystalline Si Solar Cell by Rie Surface Texturing
| Autor: | In-Gyu Park, Hyoung-Dong Kang, Gi-Chung Kwon, Beop-Jong Jin, Myoung-Soo Yun, Deoc-Hwan Hyun, Joung-Sik Kim, Jong-Yong Choi |
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| Rok vydání: | 2010 |
| Předmět: |
Materials science
Silicon business.industry Materials Science (miscellaneous) Energy conversion efficiency technology industry and agriculture chemistry.chemical_element Plasma Condensed Matter Physics eye diseases Process conditions law.invention chemistry law Solar cell Optoelectronics Wafer Quantum efficiency sense organs Electrical and Electronic Engineering Physical and Theoretical Chemistry Reactive-ion etching business |
| Zdroj: | Journal of the Korean Vacuum Society. 19:314-318 |
| ISSN: | 1225-8822 |
| Popis: | We fabricated a plasma texturing for multi-crystalline silicon cells using reactive ion etching (RIE). Multi-crystalline Si cells have not benefited from the cost-effective wet-chemical texturing processes that reduce front surface reflectance on single-crystal wafers. Elimination of plasma damage has been achieved while keeping front reflectance to extremely low levels. We will discuss reflectance, quantum efficiency and conversion efficiency for multi-crystalline Si solar cell by each RIE process conditions. |
| Databáze: | OpenAIRE |
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