Theoretical investigation of optical patterning of monolayers with subwavelength resolution

Autor:	Michael Mansell, Triet Nguyen, Alex Small
Rok vydání:	2010
Předmět:	Diffraction Physics business.industry STED microscopy General Physics and Astronomy Molecular physics law.invention Full width at half maximum Optics law Excited state Monolayer Stimulated emission Photolithography business Excitation
Zdroj:	Physics Letters A. 374:2681-2687
ISSN:	0375-9601
DOI:	10.1016/j.physleta.2010.04.038
Popis:	We formulate a model of monolayer patterning via optically-controlled chemical reactions, with the goal of beating the diffraction limit in photolithography. We consider the use of the proven technique of STimulated Emission Depletion (STED) to selectively place a handful of molecules in a reactive excited state. We show that repeated optical excitation has a greater effect on pattern formation than increasing the reaction rate, auguring well for experimental work. We also consider optically-controlled deposition of a soluble species via STED, and show that even for very large concentrations and excited state lifetimes the full width at half maximum of the features formed is robust against the effects of diffusion and saturation.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8cd9b10be868119776d26dd503b4f2ff https://doi.org/10.1016/j.physleta.2010.04.038 Zobrazit plný text záznamu Full Text from ScienceDirect