Evaluation methodology for assessment of dielectric degradation and breakdown dynamics using time-dependent impedance spectroscopy (TDIS)
| Autor: | Keiichiro Urabe, Tomohiro Kuyama, Koji Eriguchi |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
010302 applied physics
Materials science Condensed matter physics Time evolution 02 engineering and technology Dielectric 021001 nanoscience & nanotechnology 01 natural sciences Omega Spectral line Dielectric spectroscopy 0103 physical sciences Nyquist plot 0210 nano-technology Spectroscopy Electrical impedance |
| Zdroj: | IRPS |
| Popis: | We propose a method to analyze the dielectric degradation and breakdown dynamics under electrical stressing on the basis of time-resolved impedance $Z(\omega, t)$ spectra-time-dependent impedance spectroscopy (TDIS). Nyquist plots of $Z(\omega, t)$ show unique features at soft- and hard-breakdown stages for various dielectric films (SiO 2 , SiN, and high- $k$ ) depending on the defect creation dynamics under electrical stressing. The time evolution of $Z(\omega, t)$ spectra— $R(t)$ and $C(t)$ —implies the dynamics of defects (charge trapping/de-trapping features) during stressing in accordance with degradation kinetics. At the post-breakdown stage of high- $k$ dielectrics, the $Z(\omega, t)$ spectra was observed to be distorted, implying the presence of different degenerated phases. This method was also applied to the evaluation of plasma-induced damage to SiN films. The TDIS method is useful for investigating the electrical nature of defects and the degradation and breakdown dynamics of dielectric films. |
| Databáze: | OpenAIRE |
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