Calibration of total-reflection X-ray fluorescence using a nickel bulk sample
| Autor: | Maximilian Dobler, U. Reus, Heinrich Schwenke, Joachim Knoth, Peter Beaven |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
Total internal reflection
Materials science business.industry Analytical chemistry chemistry.chemical_element X-ray fluorescence Fluorescence Atomic and Molecular Physics and Optics Analytical Chemistry Metal Nickel Formalism (philosophy of mathematics) Optics chemistry visual_art visual_art.visual_art_medium Wafer business Instrumentation Spectroscopy |
| Zdroj: | Spectrochimica Acta Part B: Atomic Spectroscopy. 56:2275-2281 |
| ISSN: | 0584-8547 |
| Popis: | A standard-free calibration procedure for total-reflection X-ray fluorescence has been developed which is based on the Fresnel theory for the reflection and refraction of X-rays on surfaces at grazing incidence. The technique requires only a pure metal surface as reference. The formalism is described in more detail for the measurement of contaminants on silicon wafer surfaces for both film-like and particulate distributions. Only natural constants are involved in the calculations. The resulting calibration factor is compared with those obtained from the droplet method normally applied elsewhere. |
| Databáze: | OpenAIRE |
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