A stand for a projection EUV nanolithographer-multiplicator with a design resolution of 30 nm

Autor:	I. A. Kas’kov, M. N. Toropov, Nikolay I. Chkhalo, A. E. Pestov, Vladimir N. Polkovnikov, D. G. Volgunov, N. N. Salashchenko, S. Yu. Zuev, B. A. Zakalov, E. B. Kluenkov, I. G. Zabrodin, L. A. Suslov
Rok vydání:	2011
Předmět:	Wavelength Optics Computer science business.industry Extreme ultraviolet lithography Resolution (electron density) General Physics and Astronomy Nanotechnology Projection (set theory) business Image resolution
Zdroj:	Bulletin of the Russian Academy of Sciences: Physics. 75:49-52
ISSN:	1934-9432 1062-8738
Popis:	An original stand for a nanolithographer-multiplicator with an operating wavelength of 13.5 nm and a design spatial resolution of 30 nm has been developed in Russia at the Institute for Physics of Microstructures, Russian Academy of Sciences. A detailed description of basic principles and approaches used when constructing the stand and its key elements is given. The experiments planned to be performed using the stand are discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8c4807e6585cd701376869c2b51ca0cd https://doi.org/10.3103/s1062873811010278 Zobrazit plný text záznamu Full text from SpringerLink