Chemical bevelling of CdTe and CdTe/MnTe structures
Autor: | Helmut Sitter, Alberta Bonanni, Jozef Liday, R Srnanek, I Novotny |
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Rok vydání: | 1998 |
Předmět: |
Materials science
business.industry Mechanical Engineering Semiconductor materials Etching rate Condensed Matter Physics Isotropic etching Bevel Cadmium telluride photovoltaics Smooth surface law.invention Optics Optical microscope Mechanics of Materials law Etching (microfabrication) Optoelectronics General Materials Science business |
Zdroj: | Materials Science and Engineering: B. 55:225-228 |
ISSN: | 0921-5107 |
DOI: | 10.1016/s0921-5107(98)00187-1 |
Popis: | We have developed an etching procedure based on 0.5 N-K 2 Cr 2 O 7 /H 2 SO 4 that enables the preparation of bevels with smooth surface and good profile linearity through CdTe and CdTe/MnTe structures. The bevel angles obtained are in the range of 10 −5 rad. |
Databáze: | OpenAIRE |
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