Optimization of x‐ray sources for proximity lithography produced by a high average power Nd:glass laser

Autor:	Peter M. Celliers, J. Harder, Dennis L Matthews, Andrzej Bartnik, Mary A. Norton, L. B. Da Silva, Stanley Mrowka, Henryk Fiedorowicz, Lloyd A. Hackel, J. A. Abate, C.B. Dane, Juan R. Maldonado
Rok vydání:	1996
Předmět:	Materials science business.industry Energy conversion efficiency X-ray Analytical chemistry General Physics and Astronomy chemistry.chemical_element Laser law.invention L-shell Xenon Optics chemistry law Irradiation Emission spectrum Atomic number business
Zdroj:	Journal of Applied Physics. 79:8258-8268
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.362701
Popis:	We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half‐maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm. Targets were chosen to optimize emission in the 10–15 A wavelength band, including L‐shell emission from materials with atomic numbers in the range Z=24–30 and M‐shell emission from Xe (Z=54). With 1.053 μm a maximum conversion of 11% into 2π sr was measured from solid Xe targets. At 0.527 μm efficiencies of 12%–18%/(2π sr) were measured for all of the solid targets in the same wavelength band. The x‐ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2π sr) when irradiated with 1.053 μm.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8bfd4dfbb1c4f58eeed5e4ba3ad47992 https://doi.org/10.1063/1.362701 Zobrazit plný text záznamu