Normally-off Operation of Planar GaN MOS-HFET without using Etching Process

Autor:	Takuma Nanjo, Tetsuro Hayashida, A. Imai, A. Furukawa, Hidetoshi Koyama, M. Yamamuk
Rok vydání:	2016
Předmět:	Planar Materials science Etching (microfabrication) business.industry Process (computing) Optoelectronics Normally off business
Zdroj:	Extended Abstracts of the 2016 International Conference on Solid State Devices and Materials.
DOI:	10.7567/ssdm.2016.n-6-04l
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8b58cef3d3129a655da5ce1216f64c7b https://doi.org/10.7567/ssdm.2016.n-6-04l Zobrazit plný text záznamu