Preparation of La(Sr)CrO3 − δ thin film interconnector by high deposition rate laser ablation method

Autor:	Sugiura Nozomi, Shoji Otoshi, Minoru Suzuki, Hirokazu Sasaki, Atsuko Kajimura, Masamichi Ippommatsu, Chie Kurusu
Rok vydání:	1995
Předmět:	Materials science Laser ablation Analytical chemistry Sintering Mineralogy Substrate (chemistry) General Chemistry Interconnector Condensed Matter Physics General Materials Science Tube (fluid conveyance) Thin film Porosity Chemical composition
Zdroj:	Solid State Ionics. 82:107-111
ISSN:	0167-2738
DOI:	10.1016/0167-2738(95)00200-p
Popis:	A-site deficient La(Sr)CrO 3 − δ thin film interconnectors were successfully fabricated on porous La(Sr)MnO x tubes using high deposition rate laser ablation. The La(Sr)CrO 3 − δ films obtained by this method are dense and void-free. The film deposition rate was about 10 μm/min. The substrate could easily be masked in order to deposit the films in the desired shape. The substrate tube was heated at 873–1073 K. As the substrate temperature was much lower than the sintering temperature of the substrate tube, the porous micro-structures of the substrate tube were maintained. The difference in chemical composition between the film and the target was negligible.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8b26842da521641395a995754c7eb16a https://doi.org/10.1016/0167-2738(95)00200-p Zobrazit plný text záznamu Full Text from ScienceDirect