Laser microchemical techniques for reversible restructuring of gate-array prototype circuits
| Autor: | Jan H. C. Sedlacek, D. J. Silversmith, R. W. Mountain, J.Y. Tsao, Daniel J. Ehrlich, W.S. Graber |
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| Rok vydání: | 1984 |
| Předmět: |
Materials science
Circuit design Hardware_PERFORMANCEANDRELIABILITY Integrated circuit Laser Electronic Optical and Magnetic Materials law.invention CMOS Gate array Etching (microfabrication) law Hardware_INTEGRATEDCIRCUITS Electronic engineering Deposition (phase transition) Electrical and Electronic Engineering Hardware_LOGICDESIGN Electronic circuit |
| Zdroj: | IEEE Electron Device Letters. 5:32-35 |
| ISSN: | 0741-3106 |
| DOI: | 10.1109/edl.1984.25822 |
| Popis: | Laser direct-write Al etching and poly-Si deposition have been adapted to the mask-free alteration of simple gate-array test circuits. Simple test structures on commercial CMOS chips have been reconfigured with no degradation in device or circuit performance. These new methods may be useful for rapid evaluation and optimization of integrated-circuit prototypes. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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