Outgassing Characteristics in Vacuum Chamber (I)
| Autor: | Kenya Akaishi |
|---|---|
| Rok vydání: | 2003 |
| Předmět: |
Materials science
Hydrogen Physics::Instrumentation and Detectors Thermodynamics chemistry.chemical_element Langmuir adsorption model Recombination coefficient General Relativity and Quantum Cosmology Outgassing symbols.namesake chemistry symbols Vacuum chamber Astrophysics::Earth and Planetary Astrophysics Solubility Water vapor |
| Zdroj: | Journal of Plasma and Fusion Research. 79:518-523 |
| ISSN: | 0918-7928 |
| DOI: | 10.1585/jspf.79.518 |
| Popis: | This article is a lecture on vacuum technique. The discussion matter is outgassing characteristics of water vapor and hydrogen in a vacuum chamber. The role of surface treatment of vacuum chamber is also mentioned from the view of reduction of outgassing rate. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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