Front Tracking Simulations of Ion Deposition and Resputtering

Autor:	James Glimm, S. R. Simanca, G. Vanderwoude, F. M. Tangerman, D. Tan
Rok vydání:	1999
Předmět:	Physics Surface (mathematics) Applied Mathematics Front (oceanography) Geometry Integrated circuit Tracking (particle physics) law.invention Computational Mathematics symbols.namesake Riemann problem law Trench symbols Miniaturization Deposition (phase transition)
Zdroj:	SIAM Journal on Scientific Computing. 20:1905-1920
ISSN:	1095-7197 1064-8275
Popis:	This paper describes surface evolution formulated in terms of a Hamilton--Jacobi equation and a solution algorithm based on a three-dimensional front tracking algorithm. Our method achieves sharp resolution in the evolution of surface edges and corners. This study is motivated by semiconductor chip evolution during deposition and resputtering processes. For this reason, we discuss here the effects of diffuse rescattering on surface features. We illustrate some of the three-dimensional capabilities of the front tracking algorithm. We also present a validation study by display of two-dimensional cross sections of three-dimensional simulations of a finite-length trench. The cross sections correspond to two-dimensional simulations of S. Hamaguchi and S. M. Rossnagel [ J. Vac. Sci. Technol. B, 13 (1995), pp. 183--191].
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8a678ecf9cd1a9211271b5be47e2fee5 https://doi.org/10.1137/s1064827597318393 Zobrazit plný text záznamu Plný text ve formátu PDF