Surface spectroscopic studies of the deposition of TiN thin films from tetrakis‐(dimethylamido)‐titanium and ammonia
| Autor: | W. S. Oh, P. J. Chen, D. W. Goodman, Jason S. Corneille, Charles M. Truong |
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| Rok vydání: | 1995 |
| Předmět: |
Auger electron spectroscopy
Materials science Absorption spectroscopy Inorganic chemistry Thermal desorption Infrared spectroscopy Surfaces and Interfaces Condensed Matter Physics Titanium nitride Surfaces Coatings and Films chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy Thin film Tetrakis(dimethylamido)titanium |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 13:1116-1120 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.579596 |
| Popis: | The adsorption and pyrolysis of tetrakis‐(dimethylamido)‐titanium (TDMAT), Ti[NMe2]4, on several metal substrates, were studied using x‐ray photoelectron spectroscopy, Auger electron spectroscopy, infrared reflection absorption spectroscopy and thermal desorption mass spectrometry. TDMAT was found to decompose readily above ∼480 K on metallic substrates, producing TiCxNy films exhibiting a carbon‐rich interface. However, in the presence of NH3, well below the threshold of gas‐phase reactions ( |
| Databáze: | OpenAIRE |
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