Current flow mechanism in ohmic contact to n-4H-SiC

Autor: E. A. Posse, F. Yu. Soldatenkov, T. V. Blank, Yu. A. Goldberg
Rok vydání: 2010
Předmět:
Zdroj: Semiconductors. 44:463-466
ISSN: 1090-6479
1063-7826
DOI: 10.1134/s1063782610040093
Popis: Current flow in an In-n-4H-SiC ohmic contact (n ≈ 3 × 1017 cm−3) has been studied by analyzing the temperature dependence of the per-unit-area contact resistance. It was found that the thermionic emission across an ∼0.1-eV barrier is the main current flow mechanism and the effective Richardson constant is ∼2 × 10−2 A cm−2 K−1.
Databáze: OpenAIRE