Current flow mechanism in ohmic contact to n-4H-SiC
Autor: | E. A. Posse, F. Yu. Soldatenkov, T. V. Blank, Yu. A. Goldberg |
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Rok vydání: | 2010 |
Předmět: | |
Zdroj: | Semiconductors. 44:463-466 |
ISSN: | 1090-6479 1063-7826 |
DOI: | 10.1134/s1063782610040093 |
Popis: | Current flow in an In-n-4H-SiC ohmic contact (n ≈ 3 × 1017 cm−3) has been studied by analyzing the temperature dependence of the per-unit-area contact resistance. It was found that the thermionic emission across an ∼0.1-eV barrier is the main current flow mechanism and the effective Richardson constant is ∼2 × 10−2 A cm−2 K−1. |
Databáze: | OpenAIRE |
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