Effect of surface contamination on the UHV tribological behavior of the Cu(111)/Cu(111) interface

Autor:	Christopher F. McFadden, Andrew J. Gellman
Rok vydání:	1995
Předmět:	Materials science Mechanical Engineering Metallurgy Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Adhesion Tribology Contamination Copper Sulfur Surfaces Coatings and Films Adsorption chemistry Mechanics of Materials Sputtering Saturation (chemistry)
Zdroj:	Tribology Letters. 1
ISSN:	1573-2711 1023-8883
DOI:	10.1007/bf00209774
Popis:	Friction and adhesion measurements have been made using two Cu(1 11) samples modified by the presence of atomic adsorbates. Copper surfaces with 10–15 A thick contaminant films resulting from exposure to the atmosphere exhibited a static friction coefficient of μs = 0.75 ± 0.18. A sharp increase in the friction coefficient was observed when the contaminant layer was reduced to submonolayer thickness by sputtering and for the cleanest Cu(111) surfaces studied the static friction coefficient was μs = 4.4 ± 1.3. To further investigate the tribological effect of submonolayer coverages of surface contamination adhesion experiments were performed using surfaces modified with sulfur adsorbed at coverages in the range θs = 0.0–0.39 ML (saturation). The adhesion coefficient of the clean surfaces (μad = 0.69 ± 0.20) was markedly reduced by the presence of 0.05 ML of sulfur and decreased monotonically with increasing sulfur coverage to a limiting value of μad = 0.26 ± 0.07 at θs = 0.39.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8986eac53d06e43e9ed80d9534afb15b https://doi.org/10.1007/bf00209774 Zobrazit plný text záznamu Full text from SpringerLink