Influence of background gas pressure charging potential and target distance on the spot size ablated by single pulsed electron beam
Autor: | Enrique Jackson, Akira Ueda, W. E. Collins, Chase Cox, R. Aga, Richard Mu |
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Rok vydání: | 2006 |
Předmět: | |
Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 24:L11-L14 |
ISSN: | 1520-8559 0734-2101 |
DOI: | 10.1116/1.2360970 |
Popis: | The area of spot ablated by single pulsed electron beam has been measured as a function of pulsed electron deposition (PED) parameters. These parameters are background gas pressure, charging potential and target distance. A 50 nm thick film of silver on glass is used as ablation target in order to create a clear spot that can be measured. The spot area is found to reflect the power density of the pulsed electron beam and it can be varied by adjusting the PED parameters. These results are useful in the application of PED for material fabrication. |
Databáze: | OpenAIRE |
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