First Vertical Hall Device in standard 0.35 μm CMOS technology
| Autor: | Luc Hebrard, Vincent Frick, J.P. Blondé, Jean-Baptiste Kammerer, Joris Pascal |
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| Rok vydání: | 2008 |
| Předmět: |
Engineering
Offset (computer science) Silicon business.industry Noise reduction Bandwidth (signal processing) Metals and Alloys Electrical engineering chemistry.chemical_element Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry CMOS Hall effect Hardware_INTEGRATEDCIRCUITS Hall effect sensor Electrical and Electronic Engineering business Instrumentation Fem simulations |
| Zdroj: | Sensors and Actuators A: Physical. 147:41-46 |
| ISSN: | 0924-4247 |
| DOI: | 10.1016/j.sna.2008.03.011 |
| Popis: | In order to lower the short-circuit effect due to the measurement contacts, Vertical Hall Devices (VHDs) are generally designed either in bulky N-type silicon or in the deep N-well of high-voltage CMOS technologies. In this last case, VHD can benefit from on chip circuitry for offset and 1/f noise reduction, but HVCMOS remains a costly technology. Using spinning-current, HVCMOS compatible VHDs with a resolution of 76 μT rms over a 1.6-kHz bandwidth have been demonstrated. The VHD presented here is designed in the shallow N-well of a low-cost 0.35 μm standard CMOS technology. Unlike conventional VHD, its measurement contacts are located outside the sensor active area. FEM simulations and experimental results show that the new geometry suppresses the short-circuit effect and strongly reduces the intrinsic offset and noise. Thus, without any noise and offset reduction method, this new small VHD (63 μm 2 ) reaches a resolution of 79 μT rms over a (5 Hz–1.6 kHz) bandwidth, and opens the way to the integration of 3D Hall sensors in low-cost standard CMOS technologies. |
| Databáze: | OpenAIRE |
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