| Autor: |
Chan-Jui Liu, Ching-Sang Chuang, Chih-Hung Tsai, Meng-Ting Lee, Yu-Hsin Lin, Pin-Fang Wang, Hsueh-Hsing Lu, Chia-Hsun Tu, Chen-Shuo Huang, Po-Yang Lin, Tsung-Ying Ke, Yu-Ling Lin, Keh-Long Hwu |
| Rok vydání: |
2014 |
| Předmět: |
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| Zdroj: |
SID Symposium Digest of Technical Papers. 45:114-117 |
| ISSN: |
0097-966X |
| DOI: |
10.1002/j.2168-0159.2014.tb00032.x |
| Popis: |
A highly reliable ultra-high gas barrier (UGB) was developed and applied on the fabrication of 4.3-inch flexible AMOLED. The water vapor transmission rate of the UGB on flexible substrate could achieve ∼ 10−6 g/m2-day under a calcium test (60°C and 90%RH). In addition, a delamination method to remove the flexible AMOLED from the glass carrier was proposed where the mechanical strain during the delamination is controlled within 0.2%. With the incorporation of a metallic interlayer, the damage of TFT due to the electrostatic discharges from the delaminated surfaces can be prevented. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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