Nonequilibrium Phase Morphology of Thin Poly(styrene-block-methyl methacrylate) Films
| Autor: | Wolfgang E. S. Unger, Andreas Kindermann, Andreas Lippitz, Juergen Fuhrmann, Leo Nick |
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| Rok vydání: | 1995 |
| Předmět: |
Materials science
Film plane Surfaces and Interfaces Condensed Matter Physics Methacrylate chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy Chemical engineering Phase (matter) Polymer chemistry Electrochemistry Copolymer General Materials Science Polystyrene Methyl methacrylate Thin film Spectroscopy |
| Zdroj: | Langmuir. 11:1912-1916 |
| ISSN: | 1520-5827 0743-7463 |
| DOI: | 10.1021/la00006a016 |
| Popis: | The phase morphology of ultrathin (∼15 nm), nonequilibrium films of symmetrical block copolymer (poly(styrene-block-methyl methacrylate) is studied by atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The films were spin-coated from a nonselective solvent onto silicon at room temperature. The film is microphase separated with the microphase stacking in the film plane ; i.e., both microphases contact the film surface. Topographically elevated and depressed surface areas consist of polystyrene and poly(methyl methacylate) microphases, respectively. The phase correlation length is in the range of the bulk equilibrium phase correlation length of the system. The poly(methyl methacrylate) phase extends down to the substrate. Reliable phase assignment to topographical features in AFM measurements is possible by topographical contrast enhancement through selective degradation of the poly(methyl methacrylate) microphases in a rf plasma. XPS results on the monomer composition at the film surface confirm the morphological model. |
| Databáze: | OpenAIRE |
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