| Autor: |
Noriyuki Suetsugu, Kazuyoshi Ueno, Yoshiaki Ookita, Yasuharu Okamoto, Mitsukuni Tsukihara, Fumiaki Sato, Akihiro Ochi, Tetsuya Kudo, Genshu Fuse, Tatsuya Yamada, Yusuke Ueno, Shiro Ninomiya, Michiro Sugitani, Yasuhiko Kimura, Masazumi Koike |
| Rok vydání: |
2012 |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings. |
| ISSN: |
0094-243X |
| DOI: |
10.1063/1.4766560 |
| Popis: |
Electrical characteristics of semi-conductor devices within a wafer are expected to be uniform based on control of the dose pattern during the ion implant process. SEN developed the MIND system (Mapping of Intentional Non-uniform Dosage), to provide such dose pattern control. This capability has been enhanced with MIND+. The new system provides improved two-dimensional dose pattern control with more degrees of freedom and greater accuracy than the original MIND system. In addition, MIND+ can generate practical dose patterns (see below) while using a single step implant. As a result, MIND+ provides a very powerful tool for yield enhancement without sacrificing throughput. This paper will provide more detail on the capabilities and practical applications of the MIND+ system. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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