Plasma Reactivity and Plasma-Surface Interactions During Treatment of Toluene by a Dielectric Barrier Discharge
| Autor: | Stéphane Pasquiers, J.-R. Vacher, C. Postel, L. Magne, F. Jorand, N. Blin-Simiand |
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| Rok vydání: | 2008 |
| Předmět: |
General Chemical Engineering
Formaldehyde chemistry.chemical_element General Chemistry Dielectric barrier discharge Condensed Matter Physics Photochemistry Toluene Oxygen Dissociation (chemistry) Surfaces Coatings and Films chemistry.chemical_compound chemistry Acetylene Hydroxyl radical Methyl nitrate |
| Zdroj: | Plasma Chemistry and Plasma Processing. 28:429-466 |
| ISSN: | 1572-8986 0272-4324 |
| DOI: | 10.1007/s11090-008-9135-1 |
| Popis: | Toluene removal is investigated in filamentary plasmas produced in N2 and in N2/O2 mixtures by a pulse high voltage energised DBD. Influence of the oxygen percentage (lower than 10%) and of the temperature (lower than 350°C) is examined. Toluene is removed in N2 through collisions with electrons and nitrogen excited states. The removal efficiency is a few higher in N2/O2. It increases when the temperature increases for N2 and N2/O2. Both H- and O-atoms play an important role in toluene removal because H can readily recombine with O to form OH, which is much more reactive with toluene than O. H follows from dissociation of toluene and of hydrogenated by-products by electron collisions. Detection of cyanhidric acid, acetylene, formaldehyde, and methyl nitrate strengthens that dissociation processes, to produce H and CH3, must be taken into account in kinetic analysis. Formation and treatment of deposits are also analysed. |
| Databáze: | OpenAIRE |
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