Oligomerization of an aminosilane coupling agent and its effects on the adhesion of thin polyimide films to silica
| Autor: | C.J. Lund, P.D. Murphy |
|---|---|
| Rok vydání: | 1992 |
| Předmět: |
Materials science
Aqueous solution Silicon Hydrogen chemistry.chemical_element Surfaces and Interfaces General Chemistry Adhesion Surfaces Coatings and Films Stress (mechanics) Chemical engineering chemistry Mechanics of Materials visual_art Polymer chemistry Materials Chemistry visual_art.visual_art_medium Coupling (piping) Ceramic Polyimide |
| Zdroj: | Journal of Adhesion Science and Technology. 6:33-47 |
| ISSN: | 1568-5616 0169-4243 |
| Popis: | This work studies the effects of self-oligomerization of the aminosilane coupling agent 3-aminopropyltriethoxysilanc-also called γ-aminopropyltriethoxysilane, 3-APS, γ-APS, APS or A1100 (Union Carbide)-on the adhesion of thin polyimide films to a native-oxide silica surface under no stress, i.e. T(0) conditions, and after standard 85°C/81% T& H (temperature and humidity) stress. Techniques have been developed using both silicon and hydrogen NMR to control and monitor the degree of oligomerization in aqueous solutions at low concentrations (0.1 vol %). The results of these studies suggest that: (1) Highly self-oligomerized 0.1 vol% APS solutions promote adhesion as do those with very low amounts of self-oligomerization; (2) T& H conditions cause an overall decrease in adhesion. However, this loss is not well-correlated with the degree of oligomerization and the likely perturbations of the silicon-oxygen environment at the surface; (3) If the current ideas of APS/mineral surface interactions are to be suppo... |
| Databáze: | OpenAIRE |
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