Impact of Ti Deposition Condition and Subsequent RTA on Contact Resistance of W-Bit Line in sub-micron technology DRAM
| Autor: | Young-Woo Kweon, Dae-Young Park, Ilgweon Kim, Tae-Seok Kwon, Tae-Un Youn, Se-Kyeong Choi, Nam-Sung Kim, Soo-ik Jang, Joo-Seog Park |
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| Rok vydání: | 2002 |
| Předmět: | |
| Zdroj: | Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials. |
| DOI: | 10.7567/ssdm.2002.p3-10 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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