Surface composition and structure of nickel ultra-thin films deposited on Pd(111)
| Autor: | Pedro A. P. Nascente, George G. Kleiman, Richard Landers, A. de Siervo, S.S. Maluf, Marcelo Falsarella Carazzolle |
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| Rok vydání: | 2007 |
| Předmět: |
Diffraction
Radiation Materials science Low-energy electron diffraction Annealing (metallurgy) Alloy Analytical chemistry chemistry.chemical_element engineering.material Condensed Matter Physics Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Nickel Crystallography X-ray photoelectron spectroscopy chemistry Electron diffraction engineering Physical and Theoretical Chemistry Thin film Spectroscopy |
| Zdroj: | Journal of Electron Spectroscopy and Related Phenomena. :405-408 |
| ISSN: | 0368-2048 |
| DOI: | 10.1016/j.elspec.2006.11.052 |
| Popis: | Ultra-thin nickel films deposited on the Pd(111) surface were characterized by X-ray photoelectron spectroscopy (XPS), low-energy electron diffraction (LEED), and X-ray photoelectron diffraction (XPD). Up to 3 ML coverage, a LEED (1 × 1) pattern with a diffuse background due to a random distribution of Ni atoms on the surface is observed. Annealing at 600 °C reduced the background drastically and sharp (1 × 1) spots appeared on the screen, but XPS showed no presence of nickel on the surface, indicating diffusion into the bulk. Annealing at 300 °C for 30 min yielded also a sharp (1 × 1) LEED pattern, and the XPS Ni/Pd intensity ratio decreased with annealing time. The comparison between experimental and theoretical XPD results indicated that the surface was covered partially by Ni islands and partially by a random Ni–Pd surface alloy. |
| Databáze: | OpenAIRE |
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