Epitaxial Co/sub 80/Pt/sub 20/ films with in-plane uniaxial anisotropy

Autor:	R. Schad, B. Xu, John A. Barnard, W. D. Doyle, J. Du, T.J. Klemmer
Rok vydání:	2001
Předmět:	Magnetization Magnetic anisotropy Nuclear magnetic resonance Materials science Ferromagnetism Electron diffraction Condensed matter physics Electrical and Electronic Engineering Sputter deposition Thin film Magnetic hysteresis Anisotropy Electronic Optical and Magnetic Materials
Zdroj:	IEEE Transactions on Magnetics. 37:1512-1514
ISSN:	1941-0069 0018-9464
DOI:	10.1109/20.950886
Popis:	Uniaxial Co80Pt20 epitaxial films with in-plane anisotropy were prepared by dc sputter deposition using W/Ag templates on H-terminated Si(110) substrates. The epitaxial relationship as a function of the CoPt thickness, studied by electron and X-ray diffraction, is complex for CoPt thickness 5 nm, the epitaxial relationship was found to be CoPt(1010)[0001] || W(112)[110] || Ag(110)[001]|| Si(110)[001]. Anisotropy constants were measured using in-plane torque curves and the initial magnetization curves along the hard axis. For 10 to 20 nm thick Co80Pt20, Κ1 was found to be ~ 9 × 106 erg/cc and Κ2 was negligible.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::88e35a353adcea0d5e8b8c0dd78e9185 https://doi.org/10.1109/20.950886 Zobrazit plný text záznamu