| Autor: |
Zhongwei Gao, Chih-Hung Chang, Ho-Chun Huang, Changqing Pan, Ming-Huei Shen, Yu-Wei Su, Yu-Hsuan Yang |
| Rok vydání: |
2021 |
| Předmět: |
|
| DOI: |
10.1016/b978-0-12-819718-9.00015-7 |
| Popis: |
In the development of thin-film deposition process, vacuum- and solution-based ones are the two main techniques for growing nanocrystalline materials. Solution-based process for fabricating nanocrystalline semiconductors has attracted more attention due to its low processing temperature, inexpensive capital cost, and large-area deposition capability. Chemical solution deposition is mainly performed in a batch reactor by simultaneously feeding all reactants for reaction. The desired products are then removed after the reaction is completed. Consequently, it is difficult to achieve a high reaction selectivity to minimize unwanted by-products. In this chapter, we present microreactor-assisted chemical solution deposition processes that are capable of overcoming this limitation by producing short-life molecular intermediates which is used for growing heterogeneous nanocrystalline semiconductor thin films and point-of-use deposition before homogeneous reactions. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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