Addition Effect of Argon and Water Vapor on Plasma Copolymerization of Trifluoromethanesulfonic Acid with Octafluorocyclobutane

Autor:	Osamu Tsuji, Hirohiko Nakano, Kikuko Yoshimura, Toshiaki Tatsuta, Takeshi Minaguchi
Rok vydání:	2001
Předmět:	Octafluorocyclobutane chemistry.chemical_compound Argon Polymers and Plastics chemistry Organic Chemistry Inorganic chemistry Materials Chemistry Copolymer chemistry.chemical_element Plasma Photochemistry Water vapor
Zdroj:	Journal of Photopolymer Science and Technology. 14:73-80
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.14.73
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::88a175e541c64279d260c031d544e9d7 https://doi.org/10.2494/photopolymer.14.73 Zobrazit plný text záznamu