Factors affecting emittance measurements of ion beams

Autor:	J. H. Whealton, C. C. Tsai, H. H. Haselton, W. K. Dagenhart, M. A. Akerman, J. J. Donaghy, W. L. Stirling, W. R. Becraft, D. E. Schechter
Rok vydání:	1990
Předmět:	Materials science Ion beam business.industry Ion gun Ion Transverse plane Optics Ion beam deposition Physics::Accelerator Physics Thermal emittance Atomic physics Beam emittance business Instrumentation Beam (structure)
Zdroj:	Review of Scientific Instruments. 61:783-787
ISSN:	1089-7623 0034-6748
DOI:	10.1063/1.1141494
Popis:	The emittances of hydrogen and deuterium negative ion beams produced by volume ion sources have been measured in a transverse plane normal to the beam trajectory. The extraction voltage was varied from 10 to 40 kV, and the transverse magnetic field in the Penning discharges was varied from 0.1 to 0.2 T. Measurements were made on beams with current densities up to 60 mA/cm2 at Oak Ridge National Laboratory with an emittance scanner originally developed at Los Alamos National Laboratory. The beam profile at the scanner can be used to improve the accuracy of the emittance measurements. Other factors affecting emittance measurements are discussed. This analysis may be applicable to other ion sources.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::88a00ae76964a84cf8a703eb25c0904d https://doi.org/10.1063/1.1141494 Zobrazit plný text záznamu