Characterization of 4H-SiC PMOSFET with P+ Poly-Si Gate

Autor: Chia-Lung Hung, Bing-Yue Tsui
Rok vydání: 2023
Zdroj: 2023 International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA/VLSI-DAT).
DOI: 10.1109/vlsi-tsa/vlsi-dat57221.2023.10134380
Databáze: OpenAIRE