Reduction of anatase TiO[sub 2] on Si(111) by ion beam sputtering

Autor:	V. R. R. Medicherla, S. Choudhary, D. M. Phase, K. L. Mohanta, Subrata Majumder, Shikha Varma, Vasant Sathe, Nimai C. Nayak, Vanaraj Solanki, R. R. Mohanta
Rok vydání:	2012
Předmět:	Anatase Materials science Analytical chemistry Substrate (electronics) Sputter deposition Pulsed laser deposition chemistry.chemical_compound symbols.namesake chemistry X-ray photoelectron spectroscopy Sputtering Titanium dioxide symbols Raman spectroscopy
Zdroj:	AIP Conference Proceedings.
ISSN:	0094-243X
DOI:	10.1063/1.4736930
Popis:	Titanium dioxide (TiO2) is deposited on Si(111) substrate by Pulsed Laser Deposition (PLD) technique and is investigated using Raman Spectroscopy and X-ray Photoelectron Spectroscopy (XPS) techniques. Raman Spectroscopy indicates that the as-deposited TiO2 film is in anatase phase. After sputtering in-situ in the XPS preparation chamber, TiO2 is reduced to TiO and Ti metal, and the reduction is more prominent in the top layers of the film.
Databáze:	OpenAIRE
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