Abnormal grain growth in copper films during magnetically enhanced plasma processing
| Autor: | Krishna Rajan, Munir D. Naeem, H. Leary |
|---|---|
| Rok vydání: | 1992 |
| Předmět: |
Materials science
Kinetics food and beverages chemistry.chemical_element Mineralogy Abnormal grain growth equipment and supplies Condensed Matter Physics Microstructure Copper Electronic Optical and Magnetic Materials Grain growth chemistry Chemical engineering Transmission electron microscopy Materials Chemistry Electrical and Electronic Engineering Thin film Plasma processing |
| Zdroj: | Journal of Electronic Materials. 21:1087-1091 |
| ISSN: | 1543-186X 0361-5235 |
| DOI: | 10.1007/bf02667598 |
| Popis: | The kinetics of grain growth in thin copper films during magnetically enhanced (ME) plasma processing is monitored. Transmission electron microscopy (TEM) results suggest microstructural evolution characteristic of abnormal grain growth in these films. The kinetics of abnormal grain growth appears to depend on gas pressure in the reactor. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full text from SpringerLink