Characteristics of zinc oxide thin films prepared by r.f. magnetron-mode electron cyclotron resonance sputtering
| Autor: | M. Matsuoka, Ono Kenichi, T. Inukai |
|---|---|
| Rok vydání: | 1995 |
| Předmět: |
Chemistry
Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Zinc Plasma Electron cyclotron resonance Surfaces Coatings and Films Electronic Optical and Magnetic Materials Full width at half maximum Electrical resistivity and conductivity Sputtering Cavity magnetron Materials Chemistry Deposition (law) |
| Zdroj: | Thin Solid Films. 257:22-27 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(94)06325-7 |
| Popis: | Zinc oxide thin films were reactively deposited on glass substrates by r.f. magnetron-mode sputtering employing electron cyclotron resonance (ECR) plasma, and their crystallographic characteristics, electrical resistivity and optical properties were characterized. Single-phase zinc oxide thin films were deposited at very low gas pressures of 10 −2 Pa in an O 2 and Ar mixed gas atmosphere. They exhibited a c -axis orientation of below 3 ° full width at half maximum (FWHM) for X-ray rocking curves, an extremely high resistivity of 10 7 –10 10 Ω cm, and a low optical attenuation of 3.4 dB cm −1 at a wavelength of 0.63 μm. These results indicate that irradiation of ECR plasma during deposition plays an important role in preparing high-quality zinc oxide film. |
| Databáze: | OpenAIRE |
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