Development and applications of a beam energy filter for the PI9200XJ high current implanter

Autor:	George T. Lecouras, T. Marin, Walter J. Wriggins, Wendell Boyd, Norman L. Turner, D. Wagner, Babak Adibi, Ronald J. Macklin
Rok vydání:	1993
Předmět:	inorganic chemicals Materials science Ion beam business.industry Analytical chemistry chemistry.chemical_element chemistry Filter (video) Electrode Optoelectronics High current business Boron Beam energy Energy (signal processing)
DOI:	10.1016/b978-0-444-89994-1.50129-0
Popis:	A reversed bias filter and enhanced post-acceleration electrodes have been developed for the PI9200XJ high current implanter to reduce the ion beam energy contamination. The use of the energy filter for 49 BF 2 implants reduces the atomic concentration of the dissociated fast boron to less than 0.1% of the peak atomic concentration of the boron from 49 BF 2 .
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::879f41a88d0761be706a92871fc47701 https://doi.org/10.1016/b978-0-444-89994-1.50129-0 Zobrazit plný text záznamu