| Autor: |
E. N. Beebe, V. O. Kostroun, E. Ghanbari, S. W. Janson |
| Rok vydání: |
1981 |
| Předmět: |
|
| Zdroj: |
IEEE Transactions on Nuclear Science. 28:2660-2662 |
| ISSN: |
0018-9499 |
| DOI: |
10.1109/tns.1981.4331789 |
| Popis: |
An electron beam ion source (EBIS) for the production of low energy, multiply charged ion beams to be used in atomic physics experiments has been designed and constructed. An external high perveance electron gun is used to launch the electron beam into a conventional solenoid. Novel features of the design include a distributed sputter ion pump to create the ultrahigh vacuum environment in the ionization region of the source and microprocessor control of the axial trap voltage supplies. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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