Effect of Si doping in wells of AlGaN/GaN superlattice on the characteristics of epitaxial layer

Autor: Wei Zhang, Xiaowei Zhou, Jincheng Zhang, Ziyang Liu, JunShuai Xue, Yue Hao, Yue Zhang
Rok vydání: 2012
Předmět:
Zdroj: Chinese Physics B. 21:077103
ISSN: 1674-1056
Popis: An AlGaN/GaN superlattice grown on the top of a GaN buffer induces the broadening of the full width at half maximum of (102) and (002) X-ray diffraction rocking curves. With an increase in the Si-doped concentration in the GaN wells, the full width at half maximum of the (102) rocking curves decreases, while that of the (002) rocking curves increases. A significant increase of the full width at the half maximum of the (002) rocking curves when the doping concentration reaches 2.5 × 1019 cm−3 indicates the substantial increase of the inclined threading dislocation. High level doping in the AlGaN/GaN superlattice can greatly reduce the biaxial stress and optimize the surface roughness of the structures grown on the top of it.
Databáze: OpenAIRE