Vertical Alignment of Liquid Crystal on a-SiON Thin Film Exposed by Ion Beam

Autor:	Soo-Won Hwang, Tae-Hoon Yoon, Jae Chang Kim, Bong-Kyun Jo
Rok vydání:	2009
Předmět:	Materials science Ion beam business.industry General Chemistry Atmospheric temperature range Sputter deposition Condensed Matter Physics Amorphous solid Optics Sputtering Liquid crystal Surface roughness Optoelectronics General Materials Science Thin film business
Zdroj:	Molecular Crystals and Liquid Crystals. 507:307-315
ISSN:	1563-5287 1542-1406
DOI:	10.1080/15421400903054147
Popis:	We study the properties of the vertical alignment of liquid crystal on amorphous SiON (a-SiON) thin film exposed by ion beam. a-SiON thin films are deposited on the indium-tin-oxide coated glass substrates by using radio-frequency magnetron sputtering system in the temperature range from 25 to 400°C. The transmittance and surface roughness of a-SiON thin films are enhanced with the increase in deposition temperature. After the substrates were deposited by sputtering system, we exposed them to ion beam and fabricated vertical alignment liquid crystal cells. As a result, the fabricated liquid crystal cells show uniform pretilt angle range from 88 to 89° and high thermal stability over 100°C for 20 hours.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::873d9d405b6238a30ef69639003f0326 https://doi.org/10.1080/15421400903054147 Zobrazit plný text záznamu