Effect of Surface Contamination on Thickness Evaluation of SiO2/Si by X-ray Reflectometry

Autor:	Akira Kurokawa, Toshiyuki Fujimoto, Kenji Odaka, Yasushi Azuma
Rok vydání:	2007
Předmět:	Surface (mathematics) Materials science X-ray Analytical chemistry Contamination Reflectometry
Zdroj:	Transactions of the Materials Research Society of Japan. 32:263-266
ISSN:	2188-1650 1382-3469
DOI:	10.14723/tmrsj.32.263
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::86f4878b01a1337ee2d868afd14001a2 https://doi.org/10.14723/tmrsj.32.263 Zobrazit plný text záznamu