Band-Edge Effective Work Functions by Controlling HfO2/TiN Interfacial Composition for Gate-Last CMOS

Autor:	Christopher Hinkle, Rohit Galatage, Richard Chapman, Eric Vogel, Clive Freeman, Erich Wimmer, Hiro Niimi, Andrei Li-Fatou, James Chambers, Judy Shaw
Rok vydání:	2011
Zdroj:	ECS Meeting Abstracts. :1143-1143
ISSN:	2151-2043
DOI:	10.1149/ma2011-01/16/1143
Popis:	not Available.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::868a0c7a6d33846eeccbadd62b8f5125 https://doi.org/10.1149/ma2011-01/16/1143 Zobrazit plný text záznamu