Demonstration of Deep (80μm) RIE Etching of SiC for MEMS and MMIC Applications

Autor:	W.M. Urban, David C. Sheridan, John D. Cressler, Jeff B. Casady, C.E. Ellis, H. Buhay, R.M. Strong, W.F. Valek, Richard R. Siergiej, C.F. Seiler
Rok vydání:	2000
Předmět:	Microelectromechanical systems Materials science Mechanics of Materials business.industry Etching (microfabrication) Mechanical Engineering Electronic engineering Optoelectronics General Materials Science Condensed Matter Physics business Monolithic microwave integrated circuit
Zdroj:	Materials Science Forum. :1053-1056
ISSN:	1662-9752
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8681d7595320061afec6f3ff656c3289 https://doi.org/10.4028/www.scientific.net/msf.338-342.1053 Zobrazit plný text záznamu