Resist process system

Autor:	Masami Akimoto, Kiyohisa Tateyama, Mitsuru Ushijima
Rok vydání:	1993
Předmět:	Engineering Engineering drawing business.industry General Mathematics Process (computing) Industrial and Manufacturing Engineering Computer Science Applications Resist Control and Systems Engineering Robot Wafer business Software Plural
Zdroj:	Robotics and Computer-Integrated Manufacturing. 10:ii
ISSN:	0736-5845
DOI:	10.1016/0736-5845(93)90049-p
Popis:	A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8668a3d75bdad4996e2d300744237575 https://doi.org/10.1016/0736-5845(93)90049-p Zobrazit plný text záznamu