Investigation of the optical and electrical properties of ZnO/Cu/ZnO multilayers grown by atomic layer deposition
| Autor: | Jijun Feng, Hong-Liang Lu, Hao Zhang, Hong-Ping Ma, David Wei Zhang, Jianhua Yang, Shi-Jin Ding, Jing-Tao Zhu, Tao Wang |
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| Rok vydání: | 2018 |
| Předmět: |
Diffraction
Materials science chemistry.chemical_element 02 engineering and technology Mass spectrometry 01 natural sciences law.invention Atomic layer deposition law Electrical resistivity and conductivity 0103 physical sciences Materials Chemistry Transmittance 010302 applied physics business.industry Mechanical Engineering Metals and Alloys 021001 nanoscience & nanotechnology Copper Wavelength chemistry Mechanics of Materials Optoelectronics Electron microscope 0210 nano-technology business |
| Zdroj: | Journal of Alloys and Compounds. 744:381-385 |
| ISSN: | 0925-8388 |
| DOI: | 10.1016/j.jallcom.2018.02.115 |
| Popis: | Transparent conducting oxides (TCOs) with ZnO/Cu/ZnO sandwich structure grown by atomic layer deposition (ALD) were investigated. The optical and electrical properties of the ZnO/Cu/ZnO multilayers with different Cu thickness were studied by optical spectrometry and four-point probe measurements, respectively. The structural properties were investigated using x-ray diffraction and high resolution tansmission electron microscopy. The experiment results indicated that the thickness of copper has a significant influence on the photoelectrical properties of films. A average transmittance of over 65% at visual wavelength and low resistivity of ∼3.05 × 10−4 Ω · cm were obtained when the thickness of Cu was 14 nm. The obtained results inspire us that ALD method is one of candidates for preparing high quality TCO films with high transmittance and low resistivity. |
| Databáze: | OpenAIRE |
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